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For the Inventor, By the Inventor

Utsunomiya, Japan

Naoto Sano

This inventor holds 18 USPTO granted patents. Top assignees: Canon Kabushiki Kaisha, Other. Active years: 1992-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Naoto Sano. Retrieved from https://idiyas.com/inventor/naoto-sano

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 18

% Patents Active = 72.2

Average Co-Inventor Count = 1.7

ph-index = 8

Forward Citations = 209(Granted Patents)


Location History:

  • Kunitachi, JP (1992 - 1997)
  • Utsunomiya, JP (1996 - 2006)
  • Tochigi, JP (2005 - 2006)

Company Filing History:

goldMedal17 out of 92,901 
 
Canon Kabushiki Kaisha
 patents
silverMedal2 out of 834,453 
Other
 patents
where one patent can have more than one assignee

Years Active: 1992-2006

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18 patents (USPTO):Explore Patents
1. 7145925 - Laser oscillation apparatus, exposure apparatus, semiconductor device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method (2006-12-05),
2. 7031364 - Gas laser device and exposure apparatus using the same (2006-04-18),
3. 6870865 - Laser oscillation apparatus, exposure apparatus, semiconductor device manufacturing method, semiconductor manufacturing factory, and exposure apparatus maintenance method (2005-03-22),
4. 6795167 - Projection exposure apparatus and device manufacturing method using the same (2004-09-21),
5. 6727976 - Exposure apparatus with a pulsed laser (2004-04-27),
6. 6646717 - Projection exposure apparatus and device manufacturing method using the same (2003-11-11),
7. 6348357 - Exposure apparatus with a pulsed laser (2002-02-19),
8. 6322220 - Exposure apparatus and device manufacturing method using the same (2001-11-27),
9. 6215806 - Excimer laser generator provided with a laser chamber with a fluoride passivated inner surface (2001-04-10),
10. 5969799 - Exposure apparatus with a pulsed laser (1999-10-19),
11. 5949468 - Light quantity measuring system and exposure apparatus using the same (1999-09-07),
12. 5923693 - Discharge electrode, shape-restoration thereof, excimer laser (1999-07-13),
13. 5846678 - Exposure apparatus and device manufacturing method (1998-12-08),
14. 5661547 - Exposure method and apparatus and device produced thereby in which a (1997-08-26),
15. 5597670 - Exposure method and apparatus (1997-01-28),

Title: Naoto Sano: Innovator in Laser Technology

Introduction

Naoto Sano is a prominent inventor based in Utsunomiya, Japan. He has made significant contributions to the field of laser technology, holding a total of 18 patents. His work has advanced the development of various laser apparatuses and semiconductor manufacturing methods.

Latest Patents

Sano's latest patents include a range of innovative technologies. One notable invention is a laser oscillation apparatus that features a wavelength change unit. This unit drives a wavelength selection element in a band-narrowing module, allowing for the adjustment of the oscillation wavelength of a laser beam to a target value. Additionally, he has developed a gas laser device that utilizes a discharging electrode to excite laser gas stored in a chamber. This device is designed to efficiently circulate the laser gas and optimize the output of laser light.

Career Highlights

Throughout his career, Naoto Sano has worked with notable companies, including Canon Kabushiki Kaisha. His expertise in laser technology has positioned him as a key figure in the industry, contributing to advancements that have practical applications in various fields.

Collaborations

Sano has collaborated with esteemed colleagues such as Masato Aketagawa and Yoshiyuki Nagai. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Naoto Sano's contributions to laser technology and semiconductor manufacturing have established him as a leading inventor in his field. His innovative patents continue to influence advancements in technology, showcasing his dedication to research and development.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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