The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2004
Filed:
Nov. 08, 2001
Applicant:
Inventors:
Masakatsu Ota, Tokyo, JP;
Naoto Sano, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 2/754 ; G03B 2/768 ; G03B 2/742 ; G03B 2/752 ;
U.S. Cl.
CPC ...
G03B 2/754 ; G03B 2/768 ; G03B 2/742 ; G03B 2/752 ;
Abstract
A projection exposure apparatus includes an illumination optical system for illuminating a pattern of a reticle with laser light from a continuous emission excimer laser, a projection optical system projecting the illuminated pattern onto a substrate, an adjusting device for adjusting an optical characteristic of the projection optical system in accordance with a change in wavelength of the laser, and a wavelength stabilizing device for stabilizing the wavelength of the laser light when the adjustment of the optical characteristic of the projection optical system by the adjusting device is insufficient.