The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 26, 1997
Filed:
May. 19, 1995
Masato Aketagawa, Kawasaki, JP;
Naoto Sano, Kunitachi, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a supplying device for supplying a band-narrowed laser beam, an optical system for directing the laser beam to a substrate, a detecting device for detecting a change in bandwidth of the laser beam and a stop provided on a path of the laser beam, the stop including an opening having a size which is variable to substantially compensate for the change in bandwidth of the laser beam. Also, a device is manufactured by a method of exposing a photosensitive layer of a substrate through an optical system with a band-narrowed laser beam to print a circuit pattern on the photosensitive layer, in which a bandwidth of the laser beam is substantially compensated for, upon detecting a change in bandwidth of the laser beam, by adjusting a size of an opening of a stop provided in a path of the laser beam.