The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 27, 2001
Filed:
Dec. 16, 1997
Naoto Sano, Utsunomiya, JP;
Chidane Ouchi, Utsunomiya, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
An exposure apparatus includes a first dispersing element for dispersing substantially parallel laser light, from a laser, with respect to the wavelength to provide light beams of wavelength units, a first optical system for collecting each light beam of a wavelength unit from the first dispersing element, a wavelength selecting device for passing a predetermined wavelength region of light, of the light beams of wavelength units each being collected by the first optical system, a second optical system for receiving the light from the wavelength selecting device and providing parallel light beams of wavelength units, and a second dispersing element for combining the parallel light beams of wavelength units from the second optical system, the second dispersing element having substantially the same angular dispersion as that of the first dispersing element and a direction of dispersion opposite to that of the first dispersing element.