Naoki Shibata

Title: Naoki Shibata: Innovator in Film Forming Technologies

Introduction

Naoki Shibata is a prominent inventor based in Koshi, Japan, known for his contributions to film forming technologies. With a total of five patents to his name, Shibata has made significant advancements in methods that enhance the efficiency and quality of film applications in various substrates.

Latest Patents

Shibata's latest patents include a film forming method, a storage medium, and a film forming system. The film forming method focuses on creating a coating film by applying a coating solution onto a substrate with a specific pattern of projections and recesses. This method ensures that the resulting film has a thickness that meets predetermined specifications. Another notable patent is the method of forming a tungsten film, which emphasizes low resistance. This process involves the formation of a discontinuous film containing a metal on a substrate, followed by the application of tungsten film using alternating gas supplies.

Career Highlights

Naoki Shibata is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at Tokyo Electron has allowed him to develop innovative solutions that address the challenges faced in film forming processes.

Collaborations

Shibata has collaborated with notable colleagues, including Takafumi Hasimoto and Shinichi Hatakeyama. These partnerships have contributed to the advancement of technologies in their field.

Conclusion

Naoki Shibata's innovative work in film forming technologies has positioned him as a key figure in the industry. His patents reflect a commitment to enhancing the quality and efficiency of film applications, making significant contributions to the field of electronics and materials science.