Company Filing History:

8 out of 2,874

Hitachi-high-technologies Corporation

patents

4 out of 528

Konami Digital Entertainment Co., Ltd.

patents

1 out of 1,357

Mitsubishi Rayon Company, Limited

patents

Years Active: 1991-2018

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9972776 - Plasma processing method (2018-05-15),

2. 9680090 - Plasma etching method (2017-06-13),

3. 9378758 - Plasma etching method (2016-06-28),

4. 9281470 - Plasma processing method (2016-03-08),

5. 9269892 - Plasma etching method (2016-02-23),

6. 9097754 - Method of manufacturing magnetoresistive element (2015-08-04),

7. 9017564 - Plasma etching method (2015-04-28),

8. 8740704 - Game device, control method for a game device, and a non-transitory information storage medium (2014-06-03),

9. 8728946 - Plasma etching method (2014-05-20),

10. 8414393 - Game device, control method for a game device, and a non-transitory information storage medium (2013-04-09),

11. 8317600 - Game device (2012-11-27),

12. 7651397 - Game device, program, information storage medium, game device control method, game distribution method, and game distribution device (2010-01-26),

13. 5077820 - Optical fiber photoconductor having multi-filament type optical fiber (1991-12-31),

Title: Naohiro Yamamoto: Innovator in Plasma Processing Technologies

Introduction

Naohiro Yamamoto is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing, holding a total of 13 patents. His innovative work has advanced the technology used in various applications, particularly in the semiconductor industry.

Latest Patents

Yamamoto's latest patents include a plasma processing method and a plasma etching method. The plasma processing method involves forming a pattern of a mask on a laminated film of a magnetic film and a metal oxide film. This method includes plasma etching the magnetic film in a chamber and performing plasma cleaning using a gas mixture of chlorine element-containing gas and boron trichloride gas. The plasma etching method focuses on etching a sample that consists of multiple layers, including magnetic films and metal oxide films. It utilizes carbon monoxide gas for the first etching process and a mixed gas of hydrogen and inactive gas for the second process.

Career Highlights

Throughout his career, Naohiro Yamamoto has worked with notable companies such as Hitachi High-Technologies Corporation and Konami Digital Entertainment Co., Ltd. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in plasma processing.

Collaborations

Yamamoto has collaborated with talented individuals in his field, including Makoto Suyama and Daisuke Fujita. These collaborations have fostered innovation and have led to the development of advanced technologies.

Conclusion

Naohiro Yamamoto's contributions to plasma processing technologies have established him as a key figure in the field. His innovative patents and collaborations reflect his commitment to advancing technology and improving processes in the semiconductor industry.

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Inventor’s Patent Attorneys refers to legal professionals with specialized expertise in representing inventors throughout the patent process. These attorneys assist inventors in navigating the complexities of patent law, including filing patent applications, conducting patent searches, and protecting intellectual property rights. They play a crucial role in helping inventors secure patents for their innovative creations.