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For the Inventor, By the Inventor

Madison, WI, United States of America

Myungwoong Kim

USPTO Granted Patents = 13

Average Co-Inventor Count = 3.8

ph-index = 2

Forward Citations = 34(Granted Patents)


Company Filing History:

goldMedal13 out of 4,119 
 
Wisconsin Alumni Research Foundation
 patents

Years Active: 2012-2021

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13 patents (USPTO):Explore Patents
1. 10913873 - Block copolymers with high flory-huggins interaction parameters for block copolymer lithography (2021-02-09),
2. 10465087 - Methods of making crosslinked copolymer films from inimer-containing random copolymers (2019-11-05),
3. 10252914 - Nanostructured graphene with atomically-smooth edges (2019-04-09),
4. 10106699 - Inimer-containing random copolymers and crosslinked copolymer films for dense polymer brush growth (2018-10-23),
5. 9803292 - Barrier guided growth of microstructured and nanostructured graphene and graphite (2017-10-31),
6. 9587136 - Block copolymers with high Flory-Huggins interaction parameters for block copolymer lithography (2017-03-07),
7. 9394177 - Nanostructured graphene with atomically-smooth edges (2016-07-19),
8. 9115255 - Crosslinked random copolymer films for block copolymer domain orientation (2015-08-25),
9. 9114998 - Methods of fabricating large-area, semiconducting nanoperforated graphene materials (2015-08-25),
10. 9105480 - Methods for the fabrication of graphene nanoribbon arrays using block copolymer lithography (2015-08-11),
11. 9097979 - Block copolymer-based mask structures for the growth of nanopatterned polymer brushes (2015-08-04),
12. 8999623 - Degradable neutral layers for block copolymer lithography applications (2015-04-07),
13. 8268180 - Methods of fabricating large-area, semiconducting nanoperforated graphene materials (2012-09-18),

Title: Innovator Myungwoong Kim: Pioneering Advances in Block Copolymer Technologies

Introduction: Myungwoong Kim, based in Madison, WI, is a prolific inventor with an impressive portfolio of 13 patents. His innovative work focuses on the development of block copolymers that have significant applications in lithography and materials science.

Latest Patents: Among his latest patents, Myungwoong Kim has made groundbreaking contributions in the field of block copolymers. One of his notable patents involves block copolymers with high Flory-Huggins interaction parameters, aimed at enhancing block copolymer lithography. He has also developed methods for creating crosslinked copolymer films from random copolymers containing atom transfer radical polymerization (ATRP) initiators, showcasing his expertise in polymer chemistry.

Career Highlights: Myungwoong Kim is affiliated with the Wisconsin Alumni Research Foundation, where he has played a key role in advancing research in polymer science. His innovative approaches have led to significant developments in the synthesis and application of advanced materials.

Collaborations: Throughout his career, Myungwoong has collaborated with esteemed colleagues like Padma Gopalan and Michael Scott Arnold. These collaborations have further strengthened the impact of his research and innovation in the field of polymers.

Conclusion: As an inventor, Myungwoong Kim is contributing to the future of materials science through his patents and research. His work with block copolymers not only demonstrates his ingenuity but also highlights the potential of his innovations in various industrial applications.

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