The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2017
Filed:
Oct. 08, 2013
Applicant:
Wisconsin Alumni Research Foundation, Madison, WI (US);
Inventors:
Padma Gopalan, Madison, WI (US);
Daniel Patrick Sweat, Madison, WI (US);
Xiang Yu, Skokie, IL (US);
Myungwoong Kim, Madison, WI (US);
Assignee:
Wisconsin Alumni Research Foundation, Madison, WI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09D 153/00 (2006.01); C08F 12/32 (2006.01); C08F 12/22 (2006.01); C08F 297/02 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
C09D 153/00 (2013.01); C08F 12/22 (2013.01); C08F 12/32 (2013.01); C08F 297/02 (2013.01); G03F 7/0002 (2013.01); Y10T 428/268 (2015.01);
Abstract
Block copolymers for use in block copolymer lithography, self-assembled films of the block copolymers and methods for polymerizing the block copolymers are provided. The block copolymers are characterized by high Flory-Huggins interaction parameters (χ). The block copolymers can be polymerized from protected hydroxystyrene monomers or from tert-butyl styrene and 2-vinylpyridine monomers.