The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 18, 2012

Filed:

Jan. 25, 2011
Applicants:

Michael S. Arnold, Middleton, WI (US);

Padma Gopalan, Madison, WI (US);

Nathaniel S. Safron, Madison, WI (US);

Myungwoong Kim, Madison, WI (US);

Inventors:

Michael S. Arnold, Middleton, WI (US);

Padma Gopalan, Madison, WI (US);

Nathaniel S. Safron, Madison, WI (US);

Myungwoong Kim, Madison, WI (US);

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B31D 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for forming a nanoperforated graphene material are provided. The methods comprise forming an etch mask defining a periodic array of holes over a graphene material and patterning the periodic array of holes into the graphene material. The etch mask comprises a pattern-defining block copolymer layer, and can optionally also comprise a wetting layer and a neutral layer. The nanoperforated graphene material can consist of a single sheet of graphene or a plurality of graphene sheets.


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