The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 11, 2015

Filed:

Mar. 14, 2013
Applicant:

Wisconsin Alumni Research Foundation, Madison, WI (US);

Inventors:

Michael S. Arnold, Middleton, WI (US);

Padma Gopalan, Madison, WI (US);

Nathaniel S. Safron, Madison, WI (US);

Myungwoong Kim, Madison, WI (US);

Jonathan Woosun Choi, Madison, WI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 31/04 (2006.01); H01L 21/04 (2006.01); H01L 21/3065 (2006.01); H01L 21/308 (2006.01); H01L 21/3105 (2006.01); H01L 21/311 (2006.01); B82Y 10/00 (2011.01);
U.S. Cl.
CPC ...
H01L 21/042 (2013.01); C01B 31/0484 (2013.01); H01L 21/3065 (2013.01); H01L 21/3086 (2013.01); H01L 21/31058 (2013.01); H01L 21/31116 (2013.01); H01L 21/31138 (2013.01); B82Y 10/00 (2013.01);
Abstract

Methods of fabricating patterned substrates, including patterned graphene substrates, using etch masks formed from self-assembled block copolymer films are provided. Some embodiments of the methods are based on block copolymer (BCP) lithography in combination with graphoepitaxy. Some embodiments of the methods are based on BCP lithography techniques that utilize hybrid organic/inorganic etch masks derived from BCP templates. Also provided are field effect transistors incorporating graphene nanoribbon arrays as the conducting channel and methods for fabricating such transistors.


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