Company Filing History:
Years Active: 1998-2013
Title: **Muneo Furuse: Innovator in Plasma Processing Technology**
Introduction
Muneo Furuse, an esteemed inventor based in Kudamatsu, Japan, has made significant contributions to the field of plasma processing. With a remarkable portfolio of 13 patents, he has continually pushed the boundaries of innovation in his area of expertise.
Latest Patents
Furuse's latest inventions include a plasma processing apparatus and a corresponding plasma processing method. His first patent describes a plasma processing apparatus designed to maintain optimal conditions during sample processing. It features an inert gas supply route connected to a process gas supply piping, allowing for precise control over the flow rate of the inert gas. This innovation ensures that, after processing, a controlled pressure is maintained, thereby preventing unwanted compound vaporization.
Additionally, he has developed a method for operating a plasma processing apparatus that effectively prevents damage to components caused by pressure differences during purging operations in a vacuum reactor, ensuring efficient operation and minimal residual gas. The innovative use of inert gas through strategically placed feed ports achieves a stable processing environment, further enhancing the reliability of the apparatus.
Career Highlights
Throughout his career, Muneo Furuse has contributed his expertise to major corporations such as Hitachi High-Technologies Corporation and Hitachi, Ltd. His work in these organizations has been instrumental in advancing plasma technology and its applications in various industrial processes.
Collaborations
Furuse has collaborated with notable peers such as Seiichi Watanabe and Tomoyuki Tamura. Together, they have driven innovation in plasmas processing, contributing to the development of more effective and efficient technologies in the field.
Conclusion
Muneo Furuse exemplifies the spirit of innovation in the realm of plasma processing. With his 13 patents and extensive work with leading companies, he continues to pave the way for advancements in technology that promise to improve industrial processes and applications worldwide. His contributions not only showcase his talent as an inventor but also highlight the collaborative nature of technological progress.