The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2013
Filed:
Aug. 09, 2012
Tomohiro Ohashi, Shunan, JP;
Akitaka Makino, Hikari, JP;
Hiroho Kitada, Kudamatsu, JP;
Muneo Furuse, Kudamatsu, JP;
Tomoyuki Tamura, Kudamatsu, JP;
Tomohiro Ohashi, Shunan, JP;
Akitaka Makino, Hikari, JP;
Hiroho Kitada, Kudamatsu, JP;
Muneo Furuse, Kudamatsu, JP;
Tomoyuki Tamura, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
A plasma processing apparatus is provided which includes an inert gas supply route connected to a process gas supply piping which supplies a process gas into a processing chamber in a vacuum vessel, a valve which opens or closes the inert gas supply route, and an adjuster which adjusts a flow rate of the inert gas. When processing of a sample is complete, an inert gas is supplied into the process gas supply piping so that a pressure in the process gas supply piping is maintained at a pressure higher than a pressure at which a compound of the process gas and a material of an inner wall of the process gas supply piping vaporizes.