Company Filing History:
Years Active: 2013-2014
Title: Innovations by Hiroho Kitada - Pioneering Advancements in Wafer Processing Technology
Introduction
Hiroho Kitada, an inventive mind from Kudamatsu, Japan, has made significant contributions to the field of wafer processing technology. With a total of three patents to his name, Kitada’s inventions focus on optimizing the efficiency and precision of wafer handling and processing methods. His work has established him as an influential figure in the semiconductor industry.
Latest Patents
Two of Hiroho Kitada's latest patents showcase his innovative approach to wafer processing. The first patent, titled "Wafer processing based on sensor detection and system learning," introduces a sophisticated vacuum processing apparatus. This device consists of a robot connected to a vacuum container, responsible for transporting wafers to and from the processing chamber. The apparatus incorporates a detection unit that measures deviations in wafer position during transport. An adjusting device is then utilized to recalibrate the robot's operation based on these detected deviations, ensuring accuracy through an initial teaching operation followed by a second adjustment based on established patterns.
The second patent, "Plasma processing apparatus and operation method thereof," describes a plasma processing apparatus comprising a processing chamber within a vacuum container. This setup generates plasma under reduced pressure conditions, enabling the effective processing of wafers. A unique feature of this invention includes a sample stage with vertically movable pins that can manipulate the wafer's position, optimizing the processing process. Gas is strategically supplied into the chamber through openings in the sample stage, enhancing the operational efficiency of the apparatus when no wafer is present.
Career Highlights
Hiroho Kitada has dedicated his professional career to innovating in the semiconductor technology sector. He currently works for Hitachi High-Technologies Corporation, a prominent company known for its advancements in high-tech solutions. His role at the corporation allows him to contribute to groundbreaking technologies, particularly in wafer processing, that continue to push the boundaries of the industry.
Collaborations
Throughout his career, Hiroho Kitada has collaborated with talented colleagues, including Tomohiro Ohashi and Akitaka Makino. These partnerships have fostered a dynamic environment for innovation, allowing the team to combine their expertise and creativity to enhance the performance and efficacy of wafer processing technologies.
Conclusion
Hiroho Kitada exemplifies the spirit of innovation within the technology sector. His patents not only demonstrate his technical skill but also his dedication to improving processes critical to chip manufacturing. As Kitada continues his work at Hitachi High-Technologies Corporation, the semiconductor industry awaits further advancements inspired by his inventive contributions.