The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 12, 2012
Filed:
Mar. 04, 2009
Takahisa Hashimoto, Shunan, JP;
Hideki Kihara, Kudamatsu, JP;
Muneo Furuse, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The invention provides a plasma processing apparatus and a method for purging the apparatus, capable of preventing damage of components caused by pressure difference during purging operation of a vacuum reactor, and capable of preventing residual processing gas from remaining in the vacuum reactor. Inert gas is introduced through an inert gas feed porton a side wall of a depressurized processing chamber (V)of a plasma processing apparatus, and the interior of the processing chamber (V)is brought to predetermined pressure by the inert gas, and thereafter, the inert gas is supplied to processing gas supply pathsand(V) communicated to a plurality of through holesfor introducing processing gas, so as to introduce the inert gas through the plurality of through holesinto the processing chamber (V)