The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2005
Filed:
Mar. 03, 2003
Douglas M. Trickett, Kudamatsu, JP;
Muneo Furuse, Kudamatsu, JP;
Douglas M. Trickett, Kudamatsu, JP;
Muneo Furuse, Kudamatsu, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The present invention comprises an aluminum base materialconstituting the plasma processing chamber of the plasma processing apparatus, a bonding layerdeposited on the base material consisting of a transition metal or transition metal alloy that modifies the difference in thermal expansion coefficient of the base material and the material constituting a plasma contact surface, and the plasma contact surfaceformed of a material selected from a group consisting of LaO, LaAlO, MgLaAlO, and a mixture of LaOand AlObeing a metal oxide including at least La and O deposited on the bonding layervia a thermal spray process.