Douglas M Trickett

Title: The Innovations of Douglas M Trickett in Plasma Processing Technology

Introduction

Douglas M Trickett is an innovative inventor based in Kudamatsu, Japan. He has made notable contributions to the field of plasma processing technology, with a particular focus on improving the efficacy and durability of plasma processing chambers. His expertise and forward-thinking approach have resulted in the development of a valuable patent.

Latest Patents

Trickett holds a patent titled "Method for coating internal surface of plasma processing chamber." This invention involves an aluminum base material constituting the plasma processing chamber, accompanied by a bonding layer that comprises a transition metal or transition metal alloy. This layer is designed to address the discrepancies in thermal expansion coefficients between the base material and the plasma contact surface. The plasma contact surface is comprised of materials selected from LaO, LaAlO, MgLaAlO, or a mixture of LaO and AlO, which are deposited onto the bonding layer through a thermal spray process. This innovative approach enhances the performance and reliability of plasma processing apparatus.

Career Highlights

Douglas M Trickett works at Hitachi High-Technologies Corporation, where he applies his expertise in materials and plasma processing technologies. His career at this prestigious company has been marked by significant achievements, including the development of patented technologies that have the potential to revolutionize the field of plasma processing.

Collaborations

Throughout his tenure at Hitachi High-Technologies Corporation, Trickett has collaborated with Muneo Furuse, contributing to advancements in plasma processing applications. Their partnership has fostered a mutual exchange of ideas, leading to innovative solutions within the sphere of semiconductor manufacturing and materials science.

Conclusion

Douglas M Trickett stands out as a pivotal figure in the advancement of plasma processing technology. His innovative patent illustrates not only technical ingenuity but also the potential for significant advancements in industrial applications. As he continues his work at Hitachi High-Technologies Corporation, the contributions of Trickett and his collaborations will likely lead to further innovations in the field.