Location History:
- Yokohama, JP (2004 - 2007)
- Kanagawa-ken, JP (2003 - 2008)
Company Filing History:
3 out of 2,508 
1 out of 52,711 
1 out of 832,680 Years Active: 2003-2008
Title: Mitsuko Odagaki: Innovator in Semiconductor Processing Technology
Introduction
Mitsuko Odagaki is a notable inventor based in Kanagawa-ken, Japan. She has made significant contributions to the field of semiconductor processing technology, holding a total of 4 patents. Her innovative work focuses on methods and apparatuses that enhance the efficiency and effectiveness of plating processes in semiconductor substrates.
Latest Patents
One of her latest patents is a method of performing electrolytic treatment on a conductive layer of a substrate. This invention involves a plating method and apparatus that fills metals, such as copper, into fine interconnection patterns formed in semiconductor substrates. The apparatus features a substrate holding portion that horizontally holds and rotates the substrate, ensuring that the surface to be plated faces upward. A seal material contacts the peripheral edge of the surface, creating a watertight seal. The cathode electrode passes an electric current upon contact with the substrate, while the cathode portion rotates integrally with the substrate holding portion. An electrode arm portion, positioned above the cathode, is movable both horizontally and vertically, featuring an anode that is face-down. Plating liquid is poured into the space between the surface to be plated and the anode, allowing for efficient plating treatment and related processes to be performed by a single unit.
Another significant patent is for a substrate processing apparatus that fills metals, such as copper, into fine interconnection patterns or trenches defined in semiconductor substrates. This apparatus includes a loading/unloading unit for placing a substrate cassette, a substrate treating unit for processing the substrate, and a transfer robot for moving the substrate between these units. All components are installed within a single facility, enhancing operational efficiency.
Career Highlights
Mitsuko Odagaki has worked with Ebara Corporation, where she has applied her expertise in semiconductor technology. Her work has contributed to advancements in the industry, particularly in the development of efficient substrate processing methods.
Collaborations
Throughout her career, Odagaki has collaborated with notable colleagues, including Junji Kunisawa and Natsuki Makino. These collaborations have fostered innovation and the sharing of ideas within the semiconductor field.
Conclusion
Mitsuko Odagaki's contributions to semiconductor processing technology through her patents and collaborations highlight her role as a leading inventor in this field. Her innovative methods and apparatuses continue to influence the
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