Mitsuhiro Hata

Title: Mitsuhiro Hata: Innovator in Semiconductor Device Fabrication

Introduction

Mitsuhiro Hata is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor device fabrication, holding a total of 9 patents. His work focuses on developing advanced mask patterns and methods that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Hata's latest patents include innovative technologies such as "Mask patterns including gel layers for semiconductor device fabrication." This patent describes mask patterns that incorporate a resist pattern and a gel layer, which features a junction of hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Additionally, he has developed methods for forming these mask patterns and techniques for fabricating semiconductor devices using them as etching masks. Another notable patent is "Mask patterns for semiconductor device fabrication and related methods and structures." This invention outlines methods for forming integrated circuit devices, which involve creating a resist pattern on a layer of an integrated circuit device, with portions of the layer exposed through openings in the resist pattern.

Career Highlights

Mitsuhiro Hata is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His work has been instrumental in advancing the capabilities of integrated circuits and enhancing the overall performance of semiconductor devices.

Collaborations

Hata has collaborated with notable colleagues, including Sang-Gyun Woo and Hyun-Woo Kim. Their combined expertise has contributed to the successful development of innovative technologies in the semiconductor field.

Conclusion

Mitsuhiro Hata's contributions to semiconductor device fabrication are noteworthy, with a focus on developing advanced mask patterns and methods. His work at Samsung Electronics Co., Ltd. and his collaborations with esteemed colleagues highlight his commitment to innovation in this critical industry.