The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 22, 2008
Filed:
Sep. 22, 2005
Jung-hwan Hah, Gyeonggi-do, KR;
Hyun-woo Kim, Gyeonggi-do, KR;
Mitsuhiro Hata, Gyeonggi-do, KR;
Sang-gyun Woo, Gyeonggi-do, KR;
Jung-hwan Hah, Gyeonggi-do, KR;
Hyun-woo Kim, Gyeonggi-do, KR;
Mitsuhiro Hata, Gyeonggi-do, KR;
Sang-gyun Woo, Gyeonggi-do, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
Methods of forming an integrated circuit device may include forming a resist pattern on a layer of an integrated circuit device with portions of the layer being exposed through openings of the resist pattern. An organic-inorganic hybrid siloxane network film may be formed on the resist pattern. Portions of the layer exposed through the resist pattern and the organic-inorganic hybrid siloxane network film may then be removed. Related structures are also discussed.