The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 26, 2011
Filed:
Jul. 01, 2009
Applicants:
Mitsuhiro Hata, Gyeonggi-do, KR;
Hyun-woo Kim, Gyeonggi-do, KR;
Jung-hwan Hah, Gyeonggi-do, KR;
Sang-gyun Woo, Gyeonggi-do, KR;
Inventors:
Mitsuhiro Hata, Gyeonggi-do, KR;
Hyun-woo Kim, Gyeonggi-do, KR;
Jung-hwan Hah, Gyeonggi-do, KR;
Sang-gyun Woo, Gyeonggi-do, KR;
Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
Abstract
Mask patterns include a resist pattern and a gel layer on a surface of the resist pattern having a junction including hydrogen bonds between a proton donor polymer and a proton acceptor polymer. Methods of forming the mask patterns and methods of fabricating a semiconductor device using the mask patterns as etching masks are also provided.