The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 05, 2010
Filed:
Oct. 24, 2006
Polymer, top coating layer, top coating composition and immersion lithography process using the same
Applicants:
Mitsuhiro Hata, Seongnam-si, KR;
Sang-jun Choi, Seoul, KR;
Sang-gyun Woo, Yongin-si, KR;
Man-hyoung Ryoo, Hwaseong-si, KR;
Inventors:
Mitsuhiro Hata, Seongnam-si, KR;
Sang-Jun Choi, Seoul, KR;
Sang-Gyun Woo, Yongin-si, KR;
Man-Hyoung Ryoo, Hwaseong-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/11 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
A polymer, a top coating layer, a top coating composition and an immersion lithography process using the same are disclosed. The top coating layer polymer may include a deuterated carboxyl group having a desired acidity such that the top coating layer polymer may be insoluble with water and a photoresist, and soluble in a developer. The polymer may be included in a top coating layer and a top coating composition.