The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 10, 2008
Filed:
Nov. 17, 2005
Applicants:
Mitsuhiro Hata, Gyeonggi-do, KR;
Man-hyoung Ryoo, Gyeonggi-do, KR;
Sang-gyun Woo, Gyeonggi-do, KR;
Hyun-woo Kim, Gyeonggi-do, KR;
Jin-young Yoon, Seoul, KR;
Jung-hwan Hah, Gyeonggi-do, KR;
Inventors:
Mitsuhiro Hata, Gyeonggi-do, KR;
Man-Hyoung Ryoo, Gyeonggi-do, KR;
Sang-Gyun Woo, Gyeonggi-do, KR;
Hyun-Woo Kim, Gyeonggi-do, KR;
Jin-Young Yoon, Seoul, KR;
Jung-Hwan Hah, Gyeonggi-do, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/38 (2006.01); H01L 21/027 (2006.01); G03F 7/11 (2006.01);
U.S. Cl.
CPC ...
Abstract
Top coating compositions capable of being used in immersion lithography, and methods of forming photoresist patterns using the same, are provided. The top coating composition includes: a polymer, a base; and a solvent, wherein the polymer may be represented by Formula I: