Seoul, South Korea

Jin-young Yoon

This inventor holds 4 USPTO granted patents and 1 published patent application. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2008-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jin-young Yoon. Retrieved from https://idiyas.com/inventor/jin-young-yoon-m5yad26c

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 4 

% Patents Active = 75.0

Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 20(Granted Patents)


Company Filing History:


Years Active: 2008-2018

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4 patents (USPTO):Explore Patents

Title: Innovations of Jin-young Yoon

Introduction

Jin-young Yoon is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of four patents. His work focuses on methods that enhance the manufacturing processes of integrated circuits and semiconductor devices.

Latest Patents

One of Jin-young Yoon's latest patents is a method of forming patterns and a method of manufacturing integrated circuit devices using the same. This innovative method utilizes an organic reflection-preventing film that includes a polymer with an acid-liable group. The process involves forming a photoresist film on this organic film, exposing a selected area to generate an acid, and subsequently increasing the hydrophilicity of the film's surface. The photoresist film is then developed to remove non-exposed areas, allowing for anisotropic etching of both the organic film and the target layer.

Another notable patent is the method of forming fine patterns of a semiconductor device. This method includes creating multiple first mask patterns on a substrate, ensuring they are separated by spaces. Capping films made of a first material are formed on the sidewalls and top surfaces of these patterns. A second mask layer, made of a second material with lower solubility, fills the spaces between the first mask patterns. The process concludes with the formation of second mask patterns from the residual portions of the second mask layer.

Career Highlights

Jin-young Yoon is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to cutting-edge advancements in semiconductor manufacturing.

Collaborations

Throughout his career, Jin-young Yoon has collaborated with notable colleagues, including Hyun-Woo Kim and Mitsuhiro Hata. These collaborations have further enriched his research and development efforts in the field.

Conclusion

Jin-young Yoon's innovative patents and contributions to semiconductor technology highlight his expertise and commitment to advancing the industry. His work continues to influence the development of integrated circuits and semiconductor devices, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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