Company Filing History:
Years Active: 1994-2009
Title: Innovative Contributions of Inventor Minoru Sugawara
Introduction
Minoru Sugawara is a notable inventor based in Kanagawa, Japan, recognized for his significant contributions in the field of technology. With a remarkable portfolio of 15 patents, his work primarily focuses on advancements in exposure masks and related manufacturing techniques that have implications in the semiconductor industry.
Latest Patents
Among Sugawara’s latest inventions is a groundbreaking method for correcting mask patterns. This invention encompasses a technique designed for exposure masks that utilize a mask blank film with reflex capabilities for extreme ultraviolet (EUV) light, as well as an absorber film strategically patterned to capture the EUV. The method involves measuring light energy when the EUV is applied both perpendicularly and at an angle to the exposure mask’s surface, allowing for precise correction of mask patterns based on these comparative energy readings.
Another notable patent involves a reflective exposure mask and its production method. This innovation details the creation of an exposure mask made up of multiple reflective layers aimed at enhancing the reflection of extreme ultraviolet light. Through careful analysis of the materials used in the absorber and buffer films, Sugawara’s method minimizes line width variation and pattern shifts after wafer exposure. This advancement is crucial for the miniaturization of transferred images, a critical requirement in modern semiconductor manufacturing.
Career Highlights
Throughout his career, Minoru Sugawara has worked with prestigious companies including Sony Corporation and Ishino Corporation Co., Ltd. His experience in these innovative environments has undoubtedly contributed to the development of several patents relevant to advanced technologies in the electronics sector.
Collaborations
Sugawara has collaborated with esteemed colleagues such as Makoto Motoyoshi and Takashi Noguchi. These partnerships have facilitated the sharing of ideas and expertise, further enriching the impact of Sugawara's inventions in the field of technology and innovation.
Conclusion
In conclusion, Minoru Sugawara’s contributions to the field of semiconductor technology through his patents and innovations have made a considerable impact. His ongoing work in improving exposure masks not only enhances manufacturing processes but also sets a foundation for future advancements in the industry.