The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 1997
Filed:
Feb. 28, 1996
Minoru Sugawara, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
A phase shifting mask has a light shielding region and a light transmitting region including a light transmitting area and a first phase shifting area which is disposed between the light transmitting area and the light shielding region. The light transmitting region also includes a second phase shifting area disposed between the light shielding region and the first phase shifting area for producing a difference in phase between light that has passed through the second phase shifting area and light that has passed through the first phase shifting area. The phase shifting mask allows an optimum exposure light intensity to be set easily even if the phase shifting area width is large, and also makes it possible to form a desired pattern image on a wafer even if there is a positional misalignment between the light shielding region and the light transmitting area.