The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 1996
Filed:
Aug. 26, 1994
Minoru Sugawara, Kanagawa, JP;
Sony Corporation, Tokyo, JP;
Abstract
An improved phase shifting mask suitable to form rectangular isolated fine patterns of a repetitive arrangement of a fine structure is disclosed. The phase shifting mask includes square patterns forming first and second light transmission areas disposed alternately and repetitively so that the ratio between the pattern width of the light transmission areas and the distance between the centers of the patterns may be about 1:2. The second light transmission areas provide transmission light having a phase different by 180 degrees from that of transmission light through the first light transmission areas. Interference of the transmission light through the two different kinds of areas reduces the intensity of light outside the patterns to enhance the resolution. Further, side lobe light intensifies the intensity of main lobe light of an adjacent pattern so that it contributes to formation of a good pattern. The phase shifting mask can be applied to formation of contact holes of a semiconductor integrated circuit which are a repeat pattern of a fine structure.