The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 22, 1997
Filed:
May. 31, 1996
Applicant:
Inventor:
Minoru Sugawara, Kanagawa, JP;
Assignee:
Sony Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B / ;
U.S. Cl.
CPC ...
356394 ; 356237 ; 356239 ;
Abstract
Disclosed is a patten defect checking method which is affected neither by the presence of a correction pattern or an auxiliary pattern nor by the waveguide effect and which makes it always possible to reliably detect any defect in a pattern formed on a photo mask regardless of the type of photo mask. In the method for checking defects in a pattern formed on a photo mask, the light intensity distribution due to the light transmitted through the photo mask is compared with a light intensity distribution calculated on the basis of pattern data, whereby any defect in the pattern formed on the photo mask is detected.