Min-Ho Lee

Title: Min-Ho Lee: Innovator in Overlay Measurement Technology

Introduction

Min-Ho Lee is a prominent inventor based in Hwaseong-si, South Korea. He has made significant contributions to the field of overlay measurement technology, holding a total of seven patents. His work focuses on enhancing the precision of measurements in semiconductor manufacturing.

Latest Patents

Among his latest innovations are two notable patents related to overlay measurement devices. The first patent describes an overlay measurement device designed to measure errors between a first overlay mark and a second overlay mark formed on different layers of a wafer. This device includes a light source, an objective lens, a lens focus actuator, an auto focus module, a detector, a transmission and receipt part, and a processor. The second patent also pertains to an overlay measurement device, featuring an aperture that modifies the beam from the light source for optimal imaging of the overlay marks.

Career Highlights

Min-Ho Lee is currently employed at Auros Technology, Inc., where he continues to develop innovative solutions in the field of semiconductor technology. His expertise in overlay measurement has positioned him as a key player in advancing measurement accuracy in the industry.

Collaborations

He collaborates with talented coworkers, including Sol-Lee Hwang and Dong-Won Jung, who contribute to the innovative environment at Auros Technology, Inc.

Conclusion

Min-Ho Lee's contributions to overlay measurement technology exemplify his commitment to innovation in the semiconductor industry. His patents reflect a deep understanding of the complexities involved in precise measurements, making him a valuable asset to his company and the field at large.