Kawasaki, Japan

Miki Shinomiya


Average Co-Inventor Count = 3.6

ph-index = 1


Company Filing History:


Years Active: 2017-2019

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4 patents (USPTO):

Title: Miki Shinomiya: Innovator in Resist Pattern Technology

Introduction

Miki Shinomiya is a prominent inventor based in Kawasaki, Japan. She has made significant contributions to the field of resist pattern technology, holding a total of 4 patents. Her innovative work has advanced the methods used in semiconductor manufacturing and related industries.

Latest Patents

Miki's latest patents include a method of recovering a defect portion of a resist pattern formed on a substrate. This method involves applying a shrinking agent composition to cover the resist pattern with defects, forming a developing solution-insoluble region, and developing the covered resist pattern. The shrinking agent composition contains a polymeric compound that is either a homopolymer or a random copolymer. Another notable patent involves a polymeric compound that includes specific structural units and a resist composition that incorporates these units. This compound is designed to enhance the performance and reliability of resist patterns in various applications.

Career Highlights

Miki Shinomiya works at Tokyo Ohka Kogyo Co., Ltd., a company known for its innovations in chemical products for the electronics industry. Her work has been instrumental in developing advanced materials that improve the efficiency and effectiveness of resist patterns used in semiconductor fabrication.

Collaborations

Miki collaborates with talented coworkers, including Daichi Takaki and Kotaro Endo. Their combined expertise contributes to the innovative projects at Tokyo Ohka Kogyo Co., Ltd.

Conclusion

Miki Shinomiya's contributions to resist pattern technology exemplify her dedication to innovation in the field. Her patents and collaborative efforts continue to influence advancements in semiconductor manufacturing.

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