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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9671690 B1

PDFFull Text
Date of Patent:
Jun. 06, 2017

Filed:

Mar. 16, 2016

Resist composition, method for forming resist pattern, photo-reactive quencher and compound

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Takashi Nagamine, Kawasaki, JP;

Daichi Takaki, Kawasaki, JP;

Miki Shinomiya, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

Sin Lee

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01); G03F 7/32 (2006.01); C07C 309/04 (2006.01); C07C 309/19 (2006.01); C07C 309/25 (2006.01); C07C 309/29 (2006.01); C07C 309/30 (2006.01); C07C 381/12 (2006.01); C07C 311/04 (2006.01); C07C 309/07 (2006.01); C07C 309/06 (2006.01); C07C 65/05 (2006.01); C07C 53/21 (2006.01); C07D 307/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 53/21 (2013.01); C07C 65/05 (2013.01); C07C 309/04 (2013.01); C07C 309/06 (2013.01); C07C 309/07 (2013.01); C07C 309/19 (2013.01); C07C 309/25 (2013.01); C07C 309/29 (2013.01); C07C 309/30 (2013.01); C07C 311/04 (2013.01); C07C 381/12 (2013.01); C07D 307/00 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); C07C 2102/42 (2013.01); C07C 2103/74 (2013.01);
Abstract

A resist composition which generates an acid upon exposure and whose solubility in a developing solution changes under the action of an acid. The composition includes a base material component whose solubility in a developing solution changes under the action of an acid; an acid generator component which generates an acid upon exposure; and a photo-reactive quencher which contains a compound represented by the general formula shown below: in which Rarepresents an alkyl group having 1 to 10 carbon atoms which may have a substituent; and Raand Raeach independently represent an alkyl group having 1 to 10 carbon atoms which may have a substituent. Xrepresents a counter anion.

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