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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9682951 B1

PDFFull Text
Date of Patent:
Jun. 20, 2017

Filed:

Mar. 22, 2016

Resist composition, method of forming resist pattern, acid generator, photoreactive quencher, and compound

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Inventors:

Takashi Nagamine, Kawasaki, JP;

Kotaro Endo, Kawasaki, JP;

Miki Shinomiya, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kawasaki-Shi, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

Martin Angebranndt

Int. Cl.
CPC ...
C07D 333/54 (2006.01); C07C 65/10 (2006.01); C07C 53/21 (2006.01); C07C 53/19 (2006.01); C07C 309/19 (2006.01); C07C 309/06 (2006.01); C07C 307/02 (2006.01); G03F 7/039 (2006.01); G03F 7/038 (2006.01); G03F 7/004 (2006.01); C07D 327/04 (2006.01); C07D 285/16 (2006.01); C07D 493/08 (2006.01); C07C 309/12 (2006.01); C07C 309/17 (2006.01); C07C 311/04 (2006.01); C07C 61/135 (2006.01);
U.S. Cl.
CPC ...
C07D 333/54 (2013.01); C07C 53/21 (2013.01); C07C 61/135 (2013.01); C07C 65/10 (2013.01); C07C 307/02 (2013.01); C07C 309/06 (2013.01); C07C 309/12 (2013.01); C07C 309/17 (2013.01); C07C 309/19 (2013.01); C07C 311/04 (2013.01); C07D 285/16 (2013.01); C07D 327/04 (2013.01); C07D 493/08 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); C07C 2103/68 (2013.01); C07C 2103/74 (2013.01);
Abstract

A resist composition which generates acid upon exposure and exhibits changed solubility in a developing solution under action of acid, and which includes a base component which exhibits changed solubility in a developing solution under action of acid and an acid-generator component including a compound (B0-1) represented by general formula (b0) shown below in which Rarepresents an aromatic ring; Rarepresents an alkyl group of 5 or more carbon atoms optionally having a substituent; Raand Raeach independently represents an alkyl group of 1 to 10 carbon atoms optionally having a substituent; n1 represents an integer of 1 to 5; n2 represents an integer of 0 to 2; n3 represents an integer of 0 to 4; and Xrepresents a counteranion.

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