Plainsboro, NJ, United States of America

Mikhail Belousov

This inventor holds 16 USPTO granted patents and 3 published patent applications and 1 EPO patent, primarily in Chemical Vapor Deposition. Top assignee: Veeco Instruments Inc.. Active years: 2007-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mikhail Belousov. Retrieved from https://idiyas.com/inventor/mikhail-belousov

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 16 

% Patents Active = 6.3

 

Average Co-Inventor Count = 3.1

ph-index = 5

Forward Citations = 69(Granted Patents)


Company Filing History:


Years Active: 2007-2018

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Areas of Expertise:
Chemical Vapor Deposition
Temperature Control
GaN Materials
Material Characterization
Temperature Distribution
Flow Inlet Elements
Batch Processing
Reflective Surface Measurement
Calibration Wafer
Elevated Temperature Gas Injection
Non-Contact Methods
In Situ Calibration
16 patents (USPTO):Explore Patents

Title: Mikhail Belousov: Innovator in Chemical Vapor Deposition Technology

Introduction

Mikhail Belousov is a prominent inventor based in Plainsboro, NJ, known for his significant contributions to the field of chemical vapor deposition technology. With a total of 16 patents to his name, Belousov has made remarkable advancements that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among his latest patents, Belousov has developed innovative solutions such as the "Chemical vapor deposition flow inlet elements and methods." This patent describes a flow inlet element for a chemical vapor deposition reactor, which consists of multiple elongated tubular elements arranged side-by-side. These elements are designed to eject gas in a downstream direction, optimizing the gas distribution within the reactor. Another notable patent is for "Processing methods and apparatus with temperature distribution control." This invention provides a wafer treatment process that allows for the injection of fill gas into gaps between wafers and the wafer carrier, enabling the control of temperature uniformity during processing.

Career Highlights

Belousov's career is marked by his role at Veeco Instruments Inc., where he has been instrumental in developing cutting-edge technologies that support the semiconductor industry. His work has not only advanced the technical capabilities of chemical vapor deposition but has also contributed to the overall efficiency of wafer processing.

Collaborations

Throughout his career, Belousov has collaborated with talented individuals such as Bojan Mitrovic and Alexander I Gurary. These collaborations have fostered an environment of innovation and have led to the successful development of various technologies in the field.

Conclusion

Mikhail Belousov's contributions to chemical vapor deposition technology exemplify his dedication to innovation and excellence. His patents and work at Veeco Instruments Inc. continue to influence the semiconductor industry, paving the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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