The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2014
Filed:
Sep. 07, 2012
Mikhail Belousov, Plainsboro, NJ (US);
Bojan Mitrovic, Somerset, NJ (US);
Keng Moy, Basking Ridge, NJ (US);
Mikhail Belousov, Plainsboro, NJ (US);
Bojan Mitrovic, Somerset, NJ (US);
Keng Moy, Basking Ridge, NJ (US);
Veeco Instruments Inc., Plainview, NY (US);
Abstract
A flow inlet element () for a chemical vapor deposition reactor () is formed from a plurality of elongated tubular elements () extending side-by-side with one another in a plane transverse to the upstream to downstream direction of the reactor. The tubular elements have inlets for ejecting gas in the downstream direction. A wafer carrier () rotates around an upstream to downstream axis. The gas distribution elements may provide a pattern of gas distribution which is asymmetrical with respect to a medial plane () extending through the axis.