The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2009
Filed:
May. 12, 2005
Mikhail Belousov, Plainsboro, NJ (US);
Boris Volf, Hightstown, NJ (US);
Mikhail Belousov, Plainsboro, NJ (US);
Boris Volf, Hightstown, NJ (US);
Veeco Instruments Inc., Plainview, NY (US);
Abstract
A method for monitoring the curvature of a surface of a body such as a semiconductor wafer () includes directing a beam of light along an impingement axis () onto the surface so that a beam of light () is reflected from the surface at a point of impingement. The position of the reflected beam () is detected in two dimensions (x,y). The body () is moved relative to the impingement axis () in a direction transverse to the impingement axis and the beam-directing and position determining steps are repeated. The curvature of the surface is calculated from the detected positions of the reflected beam in a plurality of repetitions.