Veghel, Netherlands

Michael Ten Bhomer

This inventor holds 2 USPTO granted patents and 1 EPO patent. Top assignee: Asml Netherlands B.v.. Active years: 2006.


% Patents Active = 100.0


Average Co-Inventor Count = 5.1

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2006

Loading Chart...
Loading Chart...
2 patents (USPTO):Explore Patents

Title: Innovation in Lithographic Technology: The Inventor Michael Ten Bhömer

Introduction:

Michael Ten Bhömer, a talented inventor based in Veghel, the Netherlands, has made significant contributions to the field of lithographic technology with his creative patents and innovative solutions.

Latest Patents:

Michael Ten Bhömer's latest patents include two groundbreaking innovations in the field of lithographic apparatus and device manufacturing methods. These patents showcase his expertise in developing advanced systems to enhance the efficiency and precision of semiconductor manufacturing processes.

Career Highlights:

With a total of 2 patents to his name, Michael Ten Bhömer has demonstrated a keen understanding of lithographic technology. His work at ASML Netherlands B.V., a leading company in the semiconductor industry, has been instrumental in pushing the boundaries of technology and setting new standards in the field.

Collaborations:

Throughout his career, Michael Ten Bhömer has collaborated with various experts in the industry to bring his inventions to life. His partnership with coworkers such as Wilhelmus Josephus Box and Bernardus Antonius Johannes Luttikhuis has led to the development of cutting-edge solutions that have revolutionized the semiconductor manufacturing process.

Conclusion:

In conclusion, Michael Ten Bhömer's dedication to innovation and his expertise in lithographic technology have established him as a prominent figure in the field. His patents and collaborations reflect his commitment to pushing the boundaries of technology and driving advancements in semiconductor manufacturing.

Profile summary based on public USPTO records.
Please report any incorrect information to [email protected]
Loading…