Asml Netherlands B.v.

Michael Ten Bhomer

Wilhelmus Josephus Box

Bernardus Antonius Johannes Luttikhuis

Ferdy Migchelbrink

Jan Jaap Kuit

Carlo Cornelis Maria Luijten

Petrus Rutgerus Bartray

Pertrus Rutgerus Bartray

A lithographic apparatus is provided that includes an illumination system for conditioning a beam of radiation, and a support for supporting a patterning device. The patterning device serves to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate table for holding a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, an isolated reference frame for providing a reference surface, and a measuring system for measuring the substrate with respect to the reference surface. The reference frame includes a material having a coefficient of thermal expansion of greater than about 2.9&#xd7;10/K.

Lithographic apparatus and device manufacturing method

A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame that provides a reference surface with respect to which a position of at least one of the substrate and the patterning structure is measured. The reference frame includes a material that has a coefficient of thermal expansion of greater than about 2.9&#xd7;10/K.

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Veghel, Netherlands

Michael Ten Bhomer