The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 13, 2006
Filed:
Dec. 16, 2003
Pertrus Rutgerus Bartray, Ysselsteyn, NL;
Wilhelmus Josephus Box, Eksel, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Michael Ten Bhomer, Veghel, NL;
Pertrus Rutgerus Bartray, Ysselsteyn, NL;
Wilhelmus Josephus Box, Eksel, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
Michael Ten Bhomer, Veghel, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus is disclosed. The apparatus includes an illumination system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to impart the beam of radiation with a pattern in its cross-section. The apparatus also includes a substrate support that supports a substrate, a projection system that projects the patterned beam onto a target portion of the substrate, and a reference frame that provides a reference surface with respect to which a position of at least one of the substrate and the patterning structure is measured. The reference frame includes a material that has a coefficient of thermal expansion of greater than about 2.9×10/K.