Location History:
- San Jose, CA (US) (2017 - 2019)
- Sunnyvale, CA (US) (2019)
Company Filing History:
Years Active: 2017-2019
Title: Michael Lennek: Innovator in Defect Detection Technologies
Introduction
Michael Lennek is a prominent inventor based in San Jose, CA, known for his contributions to the field of defect detection technologies. With a total of 5 patents to his name, Lennek has made significant strides in developing methods and systems that enhance the accuracy and efficiency of inspection processes.
Latest Patents
Among his latest patents, Lennek has developed a system for determining one or more characteristics of a pattern of interest on a specimen. This innovative system is designed to acquire output from an inspection system generated at the pattern of interest instances without detecting defects. The output is utilized to generate a selection of these instances, allowing for a more focused analysis. Another notable patent involves production sample shaping that preserves re-normalizability. This method identifies a set of defects on a wafer with diverse values and generates tiles for different defects, facilitating the creation of defect samples that are representative of the overall defect population.
Career Highlights
Michael Lennek is currently employed at KLA-Tencor Corporation, a leading company in the semiconductor industry. His work at KLA-Tencor has positioned him at the forefront of innovation in defect detection and analysis technologies. Lennek's expertise and contributions have been instrumental in advancing the capabilities of inspection systems used in semiconductor manufacturing.
Collaborations
Throughout his career, Lennek has collaborated with notable colleagues, including Martin Plihal and Brian Duffy. These collaborations have fostered a dynamic environment for innovation and have led to the development of cutting-edge technologies in the field.
Conclusion
Michael Lennek's work in defect detection technologies exemplifies the impact of innovation in the semiconductor industry. His patents and contributions continue to shape the future of inspection systems, ensuring higher quality and efficiency in manufacturing processes.