Michael Chemama

Title: Michael Chemama: Innovator in Semiconductor Technology

Introduction

Michael Chemama is a notable inventor based in Rehovot, Israel, recognized for his contributions to semiconductor technology. With a total of three patents to his name, Chemama has made significant advancements in the field, particularly in the area of three-dimensional reconstruction and lateral recess measurement in semiconductor specimens.

Latest Patents

One of Chemama's latest patents focuses on geometry-based three-dimensional reconstruction of a semiconductor specimen by solving an optimization problem. This innovative method involves obtaining images of the semiconductor specimen at different illumination angles and determining height values that inform the height profile of the specimen. The optimization problem is solved by analyzing the differences in grey level intensity between the two images, which depend on the height profile and illumination angles.

Another significant patent addresses the measurement of lateral recess in a semiconductor specimen. This system and method involve acquiring images from the surface and interior of the specimen using an electron beam. By generating GL waveforms from these images, Chemama's method estimates the widths of different layers and measures the lateral recess based on these widths.

Career Highlights

Throughout his career, Michael Chemama has worked with prominent companies in the semiconductor industry, including Applied Materials Israel Limited and Nova Corporation. His experience in these organizations has contributed to his expertise and innovative capabilities in semiconductor technology.

Collaborations

Chemama has collaborated with notable professionals in his field, including Moshe Eliasof and Konstantin Chirko. These collaborations have likely enhanced his research and development efforts, leading to impactful innovations.

Conclusion

Michael Chemama's work in semiconductor technology exemplifies the spirit of innovation and dedication to advancing the field. His patents reflect a deep understanding of complex problems and a commitment to finding effective solutions.