logo

For the Inventor, By the Inventor

Boise, ID, United States of America

Michael A Walker

This inventor holds 73 USPTO granted patents and 3 published patent applications, primarily in Semiconductor Fabrication (CPC class B24B). Top assignees: Micron Technology Incorporated, Tri-Walker, LLC. Active years: 1992-2012.

USPTO Granted Patents = 73 

% Patents Active = 87.7

Average Co-Inventor Count = 1.9

ph-index = 31

Forward Citations = 2,417(Granted Patents)

Forward Citations (Not Self Cited) = 2,400(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Boise, ID (US) (1992 - 2010)
  • Kuna, ID (US) (2001 - 2012)

Company Filing History:

goldMedal72 out of 39,102 
 
Micron Technology Incorporated
 patents
silverMedal1 out of 1 
 
Tri-Walker, LLC
 patent

Years Active: 1992-2012

Loading Chart...
Areas of Expertise:
Polishing Pad
Chemical-Mechanical Planarization
Interconnect Structures
Capacitor Electrode
Silicon Surface Treatment
Microelectronic Substrates
Trench Isolation
Material Removal
Semiconductor Substrate
Web-Format Planarizing
Self-Aligned Structures
Abrasive Polishing
73 patents (USPTO):Explore Patents
1. 8209874 - Building frame construction tools and methods using laser alignment (2012-07-03),
2. 7825450 - Sacrificial self-aligned interconnect structures (2010-11-02),
3. 7427793 - Sacrificial self-aligned interconnect structure (2008-09-23),
4. 7329917 - Permeable capacitor electrode (2008-02-12),
5. RE39665 - Optimized container stacked capacitor DRAM cell utilizing sacrificial oxide deposition and chemical mechanical polishing (2007-05-28),
6. 7179706 - Permeable capacitor electrode (2007-02-20),
7. 6995072 - Method of making sacrificial self-aligned interconnection structure (2006-02-07),
8. 6818501 - Method of making a self-aligned recessed container cell capacitor (2004-11-16),
9. 6803316 - Method of planarizing by removing all or part of an oxidizable material layer from a semiconductor substrate (2004-10-12),
10. 6784069 - Permeable capacitor electrode (2004-08-31),
11. 6672951 - Fixed abrasive polishing pad (2004-01-06),
12. 6635574 - Method of removing material from a semiconductor substrate (2003-10-21),
13. 6558234 - Method and apparatus for supporting a polishing pad during chemical-mechanical planarization of microelectronic substrates (2003-05-06),
14. 6540593 - Fixed abrasive polishing pad (2003-04-01),
15. 6527626 - Fixed abrasive polishing pad (2003-03-04),

Couldn't find inventor

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to [email protected]
Loading…