Miao-Chun Lin

Title: Innovations by Miao-Chun Lin

Introduction

Miao-Chun Lin is a notable inventor based in Tainan County, Taiwan. He has made significant contributions to the field of semiconductor processing, holding a total of 5 patents. His work focuses on methods that enhance the efficiency and effectiveness of cleaning processes in semiconductor manufacturing.

Latest Patents

Miao-Chun Lin's latest patents include innovative methods for removing residues left after plasma processes. One such method involves providing a substrate with a material layer that includes metal. A fluorine-containing plasma process is then performed, resulting in a residue that contains the metallic material on the surface of the material layer. Following this, a wet cleaning operation is conducted using a cleaning agent that consists of a solution containing water, diluted hydrofluoric acid, and an acid solution.

Another significant patent is a method for cleaning a wafer after an etching process. This method involves a substrate with an etching stop layer, a dielectric layer, and a patterned metal hard mask. An opening is defined in the dielectric layer using the patterned metal hard mask, exposing a portion of the etching stop layer. A dry etching process is performed in a helium environment to remove the exposed etching stop layer. Subsequently, a dry cleaning process is executed on the wafer surface using a mixture of nitrogen and hydrogen as reactive gases, followed by a wet cleaning process with a cleaning solution containing a trace amount of hydrofluoric acid.

Career Highlights

Miao-Chun Lin is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His work has been instrumental in advancing cleaning techniques that are crucial for maintaining the integrity of semiconductor devices.

Collaborations

Miao-Chun Lin has collaborated with notable colleagues such as Cheng-Ming Weng and Chun-Jen Huang. Their combined expertise has contributed to the development of innovative solutions in semiconductor processing.

Conclusion

Miao-Chun Lin's contributions to the field of semiconductor manufacturing through his patents and collaborative efforts highlight his role as a key innovator. His work continues to influence the industry, paving the way for advancements in cleaning processes essential for semiconductor fabrication.