The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 30, 2010
Filed:
Feb. 06, 2006
Cheng-ming Weng, Hsinchu County, TW;
Miao-chun Lin, Tainan County, TW;
Mei-chi Wang, Tainan County, TW;
Jiunn-hsiung Liao, Tainan County, TW;
Wei-cheng Yang, Tainan, TW;
Cheng-Ming Weng, Hsinchu County, TW;
Miao-Chun Lin, Tainan County, TW;
Mei-Chi Wang, Tainan County, TW;
Jiunn-Hsiung Liao, Tainan County, TW;
Wei-Cheng Yang, Tainan, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A method of removing the residue left after a plasma process is described. First, a substrate having at least a material layer thereon is provided. The material layer includes a metal. Then, a fluorine-containing plasma process is performed so that a residue containing the aforesaid metallic material is formed on the surface of the material layer. After that, a wet cleaning operation is performed using a cleaning agent to remove the residue. The cleaning agent is a solution containing water, a diluted hydrofluoric acid and an acid solution.