Mei-Chi Wang

Title: Innovator Mei-Chi Wang: Advancements in Plasma Process Residue Removal

Introduction: Mei-Chi Wang, an esteemed inventor from Tainan County, Taiwan, has made significant contributions to the field of material science with a focus on improving the efficiency of plasma processes. As a key member of United Microelectronics Corporation, his innovations aim to address challenges presented by residue management in semiconductor manufacturing.

Latest Patents: Wang holds a notable patent entitled "Method of Removing Residue Left After Plasma Process." This invention describes a systematic approach to eliminate unwanted residue formed during plasma treatments. The process begins with a substrate featuring a material layer that includes a metal. A fluorine-containing plasma process is executed, leading to the creation of a metallic residue on the material's surface. Subsequently, a wet cleaning operation, employing a cleaning agent that consists of water, diluted hydrofluoric acid, and an acid solution, is carried out to effectively remove the residue.

Career Highlights: Throughout his career at United Microelectronics Corporation, Wang has focused on enhancing plasma processing techniques to improve manufacturing outcomes and reduce waste. His dedication to innovation in this domain showcases his commitment to advancing semiconductor technologies.

Collaborations: Mei-Chi Wang collaborates with talented professionals, including coworkers Cheng-Ming Weng and Miao-Chun Lin. Together, they work on projects that aim to push the boundaries of semiconductor processing and pave the way for future innovations in the industry.

Conclusion: Mei-Chi Wang's contributions to the field of plasma processing are marked by his patented method that not only addresses residue challenges but also enhances overall manufacturing efficiency. His work at United Microelectronics Corporation exemplifies the role of dedicated inventors in fostering innovation within the technology sector.