Company Filing History:

24 out of 12,867

Advanced Micro Devices Corporation

Years Active: 2006-2015

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34 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 8925396 - Method and system for particles analysis in microstructure devices by isolating particles (2015-01-06),

2. 8888947 - Method and system for advanced process control in an etch system by gas flow control on the basis of CD measurements (2014-11-18),

3. 8835245 - Semiconductor device comprising self-aligned contact elements (2014-09-16),

4. 8658494 - Dual contact metallization including electroless plating in a semiconductor device (2014-02-25),

5. 8575041 - Repair of damaged surface areas of sensitive low-K dielectrics of microstructure devices after plasma processing by in situ treatment (2013-11-05),

6. 8440579 - Re-establishing surface characteristics of sensitive low-k dielectrics in microstructure device by using an in situ surface modification (2013-05-14),

7. 8435885 - Method and system for extracting samples after patterning of microstructure devices (2013-05-07),

8. 8423320 - Method and system for quantitative inline material characterization in semiconductor production processes based on structural measurements and related models (2013-04-16),

9. 8399358 - Establishing a hydrophobic surface of sensitive low-k dielectrics of microstructure devices by in situ plasma treatment (2013-03-19),

10. 8338293 - Method of reducing erosion of a metal cap layer during via patterning in semiconductor devices (2012-12-25),

11. 8110498 - Method for passivating exposed copper surfaces in a metallization layer of a semiconductor device (2012-02-07),

12. 8101524 - Technique for enhancing the fill capabilities in an electrochemical deposition process by edge rounding of trenches (2012-01-24),

13. 8062982 - High yield plasma etch process for interlayer dielectrics (2011-11-22),

14. 7986040 - Method of reducing erosion of a metal cap layer during via patterning in semiconductor devices (2011-07-26),

15. 7883629 - Technique for patterning differently stressed layers formed above transistors by enhanced etch control strategies (2011-02-08),

Title: Innovations and Contributions of Matthias Schaller

Introduction

Matthias Schaller, based in Dresden, Germany, is a prominent inventor known for his significant contributions to the field of microstructure device fabrication. With a remarkable portfolio of 34 patents, he has demonstrated a profound understanding of particle analysis and advanced process control techniques.

Latest Patents

Among his latest innovations, Schaller has developed a patent for a method and system for particle analysis in microstructure devices by isolating particles. This technology enhances the fabrication process by allowing detailed analyses of particles that may contaminate device surfaces. By utilizing nanoprobes and similar techniques, a well-defined measurement environment is created post-removal, enabling critical surface areas to be monitored effectively.

Additionally, he has invented a method and system for advanced process control in an etch system by gas flow control based on critical dimension measurements. This innovation controls the flow rate of gaseous components during the formation of metal lines and vias, utilizing feedback measurement data. As a result, process variations are minimized, improving the performance and reliability of metallization structures.

Career Highlights

Throughout his career, Schaller has made invaluable contributions while working with notable companies such as Advanced Micro Devices (AMD) and GlobalFoundries. His work at these organizations has allowed him to refine his skills and explore groundbreaking technologies in semiconductor manufacturing.

Collaborations

Schaller has collaborated with talented professionals in the field, including coworkers like Kai Frohberg and Daniel Fischer. Their combined expertise has contributed to the successful development of innovative solutions that address key challenges in microstructure device technology.

Conclusion

Matthias Schaller stands out as a leading inventor whose work has greatly influenced the realm of microstructure device fabrication. His innovative patents not only enhance the performance of manufacturing processes but also pave the way for future advancements in the field. As he continues to innovate, the impact of his contributions will likely resonate throughout the industry for years to come.

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