The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 25, 2014

Filed:

Aug. 11, 2010
Applicants:

Kai Frohberg, Niederau, DE;

Juergen Boemmels, Dresden, DE;

Matthias Schaller, Moritzburg, DE;

Sven Mueller, Wiednitz, DE;

Inventors:

Kai Frohberg, Niederau, DE;

Juergen Boemmels, Dresden, DE;

Matthias Schaller, Moritzburg, DE;

Sven Mueller, Wiednitz, DE;

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/74 (2006.01);
U.S. Cl.
CPC ...
Abstract

Contact elements of sophisticated semiconductor devices may be formed for gate electrode structures and for drain and source regions in separate process sequences in order to apply electroless plating techniques without causing undue overfill of one type of contact opening. Consequently, superior process uniformity in combination with a reduced overall contact resistance may be accomplished. In some illustrative embodiments, cobalt may be used as a contact metal without any additional conductive barrier materials.


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