Aalen, Germany

Matthias Roos

This inventor holds 3 USPTO granted patents and 1 EPO patent. Top assignee: Carl Zeiss Smt Gmbh. Active years: 2018-2020.


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2018-2020

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3 patents (USPTO):Explore Patents

Title: Matthias Roos: Innovator in Vacuum Systems

Introduction

Matthias Roos is a prominent inventor based in Aalen, Germany. He has made significant contributions to the field of vacuum systems, particularly in the area of EUV lithography. With a total of 3 patents to his name, Roos continues to push the boundaries of innovation in his field.

Latest Patents

Roos's latest patents focus on advanced vacuum systems designed for EUV lithography applications. One of his notable inventions is a vacuum system that includes a vacuum housing, where a vacuum environment is created. This system features a surface structure that reduces the adhesion of contaminating particles through pore-shaped depressions separated by webs. Another patent details an optical element that also incorporates a similar surface structure to minimize particle adhesion, enhancing the performance of the multilayer coating designed to reflect EUV radiation.

Career Highlights

Matthias Roos is currently employed at Carl Zeiss SMT GmbH, a leading company in the optics and lithography sector. His work has been instrumental in developing technologies that improve the efficiency and effectiveness of lithography systems. Roos's innovative approach has garnered attention within the industry, establishing him as a key figure in the advancement of vacuum technology.

Collaborations

Roos has collaborated with notable colleagues, including Eugen Foca and Martin Schilling. These partnerships have contributed to the successful development of his patented technologies and have fostered a collaborative environment for innovation.

Conclusion

Matthias Roos exemplifies the spirit of innovation in the field of vacuum systems and EUV lithography. His contributions through patents and collaborations continue to shape the future of this technology.

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