The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 26, 2019
Filed:
Feb. 13, 2017
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Matthias Roos, Aalen, DE;
Eugen Foca, Lauchheim, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A vacuum system, in particular an EUV lithography system, includes: a vacuum housing, in which a vacuum environment is formed, and also at least one component (), e.g., an optical element, having a surface () which is subjected to contaminating particles in the vacuum environment. A surface structure () is formed at the surface in order to reduce adhesion of the contaminating particles, said surface structure having pore-shaped depressions () separated from one another by webs (). The optical element has a substrate (), and a multilayer coating () applied to the substrate and configured to reflect EUV radiation (). The surface structure formed at the surface () of the multilayer coating () reduces adhesion of contaminating particles () via pore-shaped depressions () separated from one another by webs ().