The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2020
Filed:
Mar. 06, 2019
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Matthias Roos, Aalen, DE;
Eugen Foca, Lauchheim, DE;
Assignee:
CARL ZEISS SMT GMBH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); B08B 17/06 (2006.01); G02B 5/08 (2006.01); G02B 27/00 (2006.01); G21K 1/06 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70841 (2013.01); B08B 17/065 (2013.01); G02B 5/0816 (2013.01); G02B 5/0891 (2013.01); G02B 27/0006 (2013.01); G03F 7/70033 (2013.01); G03F 7/70916 (2013.01); G21K 1/062 (2013.01);
Abstract
A vacuum system, in particular an EUV lithography system, includes: a vacuum housing (), in which a vacuum environment () is formed. A surface () of the vacuum housing is subjected to contaminating particles () in the vacuum environment. A surface structure () at the surface reduces adhesion of the contaminating particles and has pore-shaped depressions () separated from one another by webs ().