The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 24, 2018

Filed:

Apr. 07, 2017
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Matthias Roos, Aalen, DE;

Eugen Foca, Lauchheim, DE;

Assignee:

Carl Zeiss SMT GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 15/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70708 (2013.01);
Abstract

A vacuum linear feed-through (), e.g., for an EUV lithography system, includes: a vacuum diaphragm bellows (), which has a first end () attaching a component and a second end (), opposite the first end, attaching to a vacuum housing, and an actuator device () generating a linear reciprocating motion of the bellows. The feed-through has at least one first shield (), connected to the bellows at the first end, and at least one second shield (), connected to the bellows at the second end. The first and second shield annularly surround the bellows, and the first and second shield overlap in the longitudinal direction of the bellows (). At least one first shield and at least one second shield are formed of a permanently magnetic material, and/or the feed-through has a voltage-generating device () generating an electric field (E) between the first shield and the second shield.


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