Matthew Carnes

Title: The Innovative Contributions of Matthew Carnes

Introduction

Matthew Carnes is a notable inventor based in Chicago, IL, with a focus on chemical mechanical polishing compositions. He holds a total of 3 patents that contribute significantly to advancements in substrate polishing technologies.

Latest Patents

One of his latest patents is titled "Composition for tungsten CMP." This invention describes a chemical mechanical polishing composition designed for polishing substrates with a tungsten layer. The composition includes a water-based liquid carrier, abrasive particles, an iron-containing accelerator, and a cationic polymer with an amino acid monomer. The method involves contacting the substrate with this polishing composition, moving it relative to the substrate, and abrading the substrate to effectively remove a portion of the tungsten layer.

Another significant patent is the "Method to increase barrier film removal rate in bulk tungsten slurry." This invention relates to a polishing composition that comprises a first abrasive of cationically modified colloidal silica particles, a second abrasive with a Mohs hardness of about 5.5 or more, a cationic polymer, an iron-containing activator, an oxidizing agent, and water. The method aims to enhance the chemical mechanical polishing of substrates, particularly those containing tungsten and barrier layers.

Career Highlights

Matthew has worked with prominent companies in the field, including CMC Materials, Inc. and Cabot Microelectronics Corporation. His experience in these organizations has allowed him to refine his expertise in chemical mechanical polishing technologies.

Collaborations

Throughout his career, Matthew has collaborated with talented individuals such as Kevin P. Dockery and Helin Huang. These collaborations have contributed to the development of innovative solutions in the field of substrate polishing.

Conclusion

Matthew Carnes is a distinguished inventor whose work in chemical mechanical polishing compositions has made a significant impact in the industry. His patents reflect his commitment to innovation and excellence in substrate technology.